2 DENS_MOD Keyword: density modification, averaging, DENS_MOD File: dens_mod.txt Last modified: 21-jul-2007 Items of the menu block "DENS_MOD" invoke density modifications (solvent flattening and averaging) tasks ("RMS_FIT", "MAK_MASK", "DM_PREP", "DM_NEXT"). The local macros are created via "create" scripts. For setup explanation see "MAIN_DOC:1mol/1mol.txt" and "MAIN_DOC:nmol/nmol.txt") and below. For a more general scope of applications see also "MAIN_DOC:dens_mod/dens_mod.txt". The menu is created with "MAIN_CMDS:load_dens_mod.com". 3 RMS_FIT Keyword: rms_fit.cmds, rms, fit, superposition, RMS_FIT Calculates all superposition matrices among all possible pairs of equivalent segments. The macro calculates rotation matrices and translation vectors, which superposition parametesr among all possible pairs of equivalent segments and "SAVE" results to files already in a form of a MAIN commands. These macros are used later in density averaging procedure to rotate the density maps. Click invokes local macro "rms_fit.cmds". key ca sele atom name CA end rms coor all eigen \ sele ca .a segm name MOLA end \ sele ca .a segm name MOLB end save over file mol_MOLA_to_MOLB.com rms Macro is configured with "create_rms_fit.pl". 3 MAK_MASK Keyword: make_masks.cmds, molecular mask, mask, envelope, MAK_MASK The macro checks for overlap between local and symmetry related neighbors and when appripriate reduces the atomic radii of touching atoms. A file "MAIN_DOC:nmol/make_masks.cmds" contains a list of commands that are actually calls to "MAIN_UTILS:make_atom_mask.com" macro providing five parameters: - The first parameter [MOLA] is segment name of the molecule around which a mask will be created. - The second parameter [2] is an appropriate map from which number of grids and layout will be calculated, usually will be used later on in averaging, - The third parameter is the maximal radius [3.6] of atoms applied for mask generation. - The fourth parameter is the map id used for the mask creation and - the fifth is the file name into which the created mask will be stored.